太阳能硅片清洗剂的研发与配方设计《浙江化工》2022年第8期

太阳能硅片清洗剂的研发与配方设计 发表于《浙江化工》2022年第8期

王成信

（上海喜赫精细化工有限公司，上海 201620）

摘  要：太阳能级硅片在金刚线切割和打磨过程中会受到严重沾污，需要采用物理或化学的方法去除其表面的污染物，以符合洁净度和表面状态的要求。为了减少对硅片的过度腐蚀以及保持清洗工作液的持久性，通过正交实验，确定了表面活性剂A组分和碱剂B组分的最佳配比。表面活性剂A组分最佳配比为无磷乙二胺二邻苯基乙酸钠：PO嵌段TEXZO-FMEE：喜赫TEXZO-FMES：伯烷基磺酸钠TEXZO-PAS：烷基糖苷APG =7:8:3:5:3。碱剂B组分最佳配比为氢氧化钾：氢氧化钠：偏硅酸钠：碳酸钠=3:1:2:2，产品环保无磷碱性适中，清洗时间短，对硅粉和金属氧化膜去除效果好，洗后的硅片表面光滑无凹坑、线痕等现象。

关键词：硅片；无磷；复配；腐蚀；耐久性

The research and formulation design of cleaning agent for solar silicon wafer

WANG Cheng-xin

（Shanghai Xihe Fine Chemical Co.,Ltd, Shanghai,201620, China）

Abstract：The silicon wafer will be heavily contaminated by diamond wire in cutting and grinding process, so it is necessary to use physical or chemical methods to remove the surface dirt. In order to reduce the excessive corrosion of silicon wafers and maintain the durability of solution, the optimum ratio of surfactant A and alkali agent B was determined by orthogonal experiment. The optimum ratio of surfactant A: non-phosphorus EDDHA-Na: Po block FMEE: FMES: primary sulfonate sodium PAS: APG = 7:8:3:5:3. The optimum proportion of alkali agent B: potassium hydroxide: sodium hydroxide: sodium metasilicate: sodium carbonate = 3:1:2:2. The product is environmentally friendly, phosphorus-free, moderately alkaline, with short cleaning time and good removal effect for silicon powder and metal oxide film, the surface of the cleaned silicon wafer is smooth without pits and line marks.